This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ulvac, Inc.. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Yuuichi Oishi: Innovator in Magnetron Sputtering Technology
Introduction
Yuuichi Oishi is a notable inventor based in Sammu, Japan. He has made significant contributions to the field of magnetron sputtering technology, which is essential for various applications in thin film deposition.
Latest Patents
Oishi holds a patent for a magnetron sputtering apparatus and method. This invention aims to provide a magnetron sputtering technique that ensures an even film thickness distribution over extended periods. The apparatus includes a vacuum chamber, a cathode part that holds a target, and a direct-current power source. Additionally, it features control electrodes that independently manage potentials in the discharge space.
Career Highlights
Oishi's work at Ulvac, Inc. has positioned him as a key player in the development of advanced sputtering technologies. His innovative approach has led to improvements in the efficiency and effectiveness of film deposition processes.
Collaborations
Oishi has collaborated with notable colleagues such as Yasuhiko Akamatsu and Kyuzo Nakamura. Their combined expertise has contributed to the advancement of magnetron sputtering techniques.
Conclusion
Yuuichi Oishi's contributions to magnetron sputtering technology highlight his role as an influential inventor in the field. His patent reflects a commitment to innovation and excellence in thin film deposition.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile