The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2025
Filed:
May. 31, 2022
Applicant:
Ulvac, Inc., Chigasaki, JP;
Inventors:
Taichi Suzuki, Chigasaki, JP;
Yasuhiro Morikawa, Chigasaki, JP;
Kenta Doi, Chigasaki, JP;
Toshiyuki Nakamura, Chigasaki, JP;
Assignee:
ULVAC, INC., Chigasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); H01J 37/32091 (2013.01); H01J 2237/20 (2013.01);
Abstract
A plasma processing device includes an inductively coupled plasma antenna including an input end and an output end, a series circuit including an additional inductor and a variable capacitor connected in series, and a controller that varies a capacitance of the variable capacitor. The input terminal is connected via an antenna matching device to an antenna power supply. The output terminal is connected to the additional inductor. The additional inductor is connected via the variable capacitor to ground.