Kenta Doi

Title: Kenta Doi: Innovator in Etching Methods

Introduction

Kenta Doi is a prominent inventor based in Chigasaki, Japan. He has made significant contributions to the field of etching methods, holding a total of 5 patents. His innovative approaches have advanced the technology used in various applications.

Latest Patents

One of Kenta Doi's latest patents is an etching method that includes a resist pattern-forming step. This method involves forming a resist layer on a target object, which is made of resin and has a resist pattern. The etching step is performed multiple times through the resist layer. Additionally, a resist protective film is formed on the resist layer, utilizing a processing gas capable of forming SiOα. Another notable patent is a silicon dry etching method. This method includes preparing a silicon substrate, forming a mask pattern, and carrying out a dry etching process while introducing specific gases. These patents showcase his expertise in developing advanced etching techniques.

Career Highlights

Kenta Doi works at Ulvac, Inc., where he continues to innovate and contribute to the field. His work has been instrumental in enhancing etching processes, which are crucial in various technological applications. His dedication to research and development has positioned him as a key figure in his industry.

Collaborations

Kenta Doi collaborates with talented individuals such as Toshiyuki Nakamura and Taichi Suzuki. These partnerships foster a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Kenta Doi is a remarkable inventor whose work in etching methods has made a significant impact in the field. His patents reflect his commitment to advancing technology and improving processes. His contributions will continue to influence the industry for years to come.