Menlo Park, CA, United States of America

Pin-Chin Connie Wang

Average Co-Inventor Count = 2.7

ph-index = 14

Forward Citations = 625(Granted Patents)

Forward Citations (Not Self Cited) = 601(Sep 21, 2024)

DiyaCoin DiyaCoin 0.29 

Inventors with similar research interests:



Years Active: 2001-2010

where 'Filed Patents' based on already Granted Patents

52 patents (USPTO):

Title: Innovations and Achievements of Pin-Chin Connie Wang

Introduction

Pin-Chin Connie Wang, based in Menlo Park, CA, is a remarkable inventor with an impressive portfolio of 52 patents. His work primarily focuses on advancing integrated circuit fabrication techniques, highlighting innovative methods that significantly enhance the performance and reliability of electronic components.

Latest Patents

Among his latest innovations is the patent for a "Method of using ternary copper alloy to obtain a low resistance and large grain size interconnect." This method involves fabricating an integrated circuit by forming a barrier layer in a via aperture and utilizing ternary copper alloy as the via material. This unique approach not only reduces the electrical resistance but also promotes an increase in grain size with refined grain boundaries, greatly benefiting the electrical connections within circuits.

Another notable patent is the "Method of using an adhesion precursor layer for chemical vapor deposition (CVD) copper deposition." This method illustrates the application of an adhesion precursor in the integrated circuit fabrication process. It includes the introduction of a gas of material over a dielectric substrate, allowing the deposition of a copper layer over an adhesion layer formed by the gas, improving both the adhesion and performance of the resulting circuits.

Career Highlights

Throughout his career, Pin-Chin has contributed to significant advancements in technology while working with prominent organizations. Notably, he has been associated with Advanced Micro Devices Corporation and Leland Stanford Junior University, where he has collaborated on cutting-edge research and development projects.

Collaborations

In his innovative journey, Pin-Chin Wang has worked alongside talented colleagues such as Amit P. Marathe and Sergey D. Lopatin. Their collaborative efforts have propelled the development of new technologies within the semiconductor industry, fostering advancements that are pivotal to modern electronics.

Conclusion

Pin-Chin Connie Wang exemplifies the spirit of innovation through his extensive work in the field of integrated circuits and semiconductor technology. His contributions not only highlight his skills as an inventor but also mark significant milestones in the evolution of electronic devices. Through his relentless pursuit of advancement, he continues to shape the future of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…