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For the Inventor, By the Inventor

Yokohama, Japan

Noriaki Oshima

This inventor holds 20 USPTO granted patents and 9 EPO patents, primarily in Thin Film Technology. Top assignees: Tosoh Corporation, Sagami Chemical Research Center, Sagami Chemical Research Institute. Active years: 1992-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriaki Oshima. Retrieved from https://idiyas.com/inventor/noriaki-oshima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20

% Patents Active = 80.0

 

Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 93(Granted Patents)


Location History:

  • Ebina, JP (1992 - 1995)
  • Kanagawa-ken, JP (2003 - 2005)
  • Yokohama, JP (1992 - 2011)
  • Ayase, JP (2014)
  • Kanagawa, JP (2009 - 2017)

Company Filing History:

goldMedal20 out of 923 
 
Tosoh Corporation
 patents
silverMedal5 out of 191 
 
Sagami Chemical Research Center
 patents
bronzeMedal3 out of 26 
 
Sagami Chemical Research Institute
 patents
where one patent can have more than one assignee

Years Active: 1992-2017

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Areas of Expertise:
Thin Film
Titanium Complex
Ruthenium Compound
Optical Recording Medium
Metal Film
Metal Powder
Film-Forming Material
Imide Complex
Bismuth Compound
Protective Coating
Organometallic Compound
Tantalum Compound
20 patents (USPTO):Explore Patents
1. 9624581 - Composition for production of metal film, method for producing metal film and method for producing metal powder (2017-04-18),
2. 9371452 - Film-forming material, group IV metal oxide film and vinylenediamide complex (2016-06-21),
3. 8779174 - Titanium complex, processes for producing the same, titanium-containing thin film, and process for producing the same (2014-07-15),
4. 8748644 - Ruthenium compound, method of producing the same, method of producing ruthenium-containing thin film using the same, and ruthenium-containing thin film (2014-06-10),
5. 8742153 - Ruthenium complex mixture, method of producing the same, composition for film formation, ruthenium-containing film, and method of producing the same (2014-06-03),
6. 7906668 - Imide complex, method for producing the same, metal-containing thin film and method for producing the same (2011-03-15),
7. 7816549 - Metal-containing compound, its production method, metal-containing thin film, and its formation method (2010-10-19),
8. 7632958 - Titanium complexes, their production methods, titanium-containing thin films, and their formation methods (2009-12-15),
9. 7592471 - Tantalum compound, method for producing same, tantalum-containing thin film and method for forming same (2009-09-22),
10. 7265233 - Organometallic iridium compound, process for producing the same and process for preparing film (2007-09-04),
11. 7050385 - Optical recording medium (2006-05-23),
12. 6916944 - Bismuth compound, process of producing the same, and process of producing a film (2005-07-12),
13. 6884902 - Organometallic iridium compound, process of producing the same, and process of producing thin film (2005-04-26),
14. 6880166 - Optical recording medium having in a static mode, a flexible region extending to 1/3 of the recording area (2005-04-12),
15. 6605735 - Ruthenium complex, process for producing the same and process for producing thin film (2003-08-12),

Title: Noriaki Oshima: Innovator in Metal Film Production

Introduction

Noriaki Oshima, a renowned inventor based in Yokohama, Japan, has made significant contributions to the field of metal film technology. With a portfolio of 20 patents, Oshima’s innovations reflect a deep understanding of material science and engineering. His work has implications for various industries, particularly in the production of semiconductors and optical elements.

Latest Patents

Among Oshima's latest patents are several groundbreaking methods for producing metal films and powders. One notable patent involves a composition for the production of a metal film, which features a high-valent compound of copper, silver, or indium combined with a linear, branched, or cyclic alcohol. This innovative composition is designed to form a metal film on a substrate when heated, offering a sophisticated approach to metal film application. Another patent details a method for producing a Group IV metal oxide film, useful for semiconductor elements, at low temperatures by utilizing a film-forming material derived from a vinylenediamide complex.

Career Highlights

Oshima's career highlights include his tenure at distinguished organizations, such as Tosoh Corporation and Sagami Chemical Research Center. His experience in these leading research institutions has equipped him with valuable insights and technical skills which he applied in his inventive endeavors. His cumulative work is not only recognized in academic circles but has also been instrumental in advancing industrial applications.

Collaborations

Throughout his career, Oshima has collaborated with notable coworkers, including Taishi Furukawa and Ken-ichi Tada. These collaborations have fostered an environment of innovation and creativity, contributing to the development of new technologies and refined methods in metal processing and film production.

Conclusion

Noriaki Oshima's contributions to the field of metal film technology demonstrate his expertise and innovative spirit. With a solid track record of patents and collaborations, Oshima continues to push the boundaries of material science, paving the way for future advancements in various technological applications. His work underscores the importance of innovation in fostering progress and enhancing the capabilities of modern industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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