The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Aug. 20, 2007
Ken-ichi Tada, Fujisawa, JP;
Taishi Furukawa, Ayase, JP;
Koichiro Inaba, Shunan, JP;
Tadahiro Yotsuya, Sagamihara, JP;
Hirokazu Chiba, Machida, JP;
Toshiki Yamamoto, Machida, JP;
Tetsu Yamakawa, Nishitokyo, JP;
Noriaki Oshima, Yokohama, JP;
Ken-ichi Tada, Fujisawa, JP;
Taishi Furukawa, Ayase, JP;
Koichiro Inaba, Shunan, JP;
Tadahiro Yotsuya, Sagamihara, JP;
Hirokazu Chiba, Machida, JP;
Toshiki Yamamoto, Machida, JP;
Tetsu Yamakawa, Nishitokyo, JP;
Noriaki Oshima, Yokohama, JP;
Tosoh Corporation, Shunan-shi, JP;
Sagami Chemical Research Center, Ayase-shi, JP;
Abstract
Objects of the present invention are to provide a novel niobium or tantalum complex having good vapor pressure and becoming a raw material for producing a niobium- or tantalum-containing thin film by a method such as CVD method, ALD method or the like, a method for producing the same, a metal-containing thin film using the same, and a method for producing the same. The present invention relates to producing an imide complex represented by the general formula (1) by, for example, the reaction between M(NR)X(L)(2) and an alkali metal alkoxide (3): (wherein Mrepresents niobium atom or tantalum atom, Rrepresents an alkyl group having from 1 to 12 carbon atoms, Rrepresents an alkyl group having from 2 to 13 carbon atoms, X represents halogen atom, r is 1 when L is 1,2-dimethoxyethane ligand, r is 2 when L is pyridine ligand, and Mrepresents an alkali metal), and producing a niobium- or tantalum-containing thin film by using the imide complex (1) as a raw material.