Kanagawa, Japan

Hirokazu Chiba

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Tokyo, JP (2009)
  • Machida, JP (2011)
  • Ayase, JP (2014)
  • Kanagawa, JP (2014 - 2016)

Company Filing History:


Years Active: 2009-2016

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6 patents (USPTO):Explore Patents

Title: Hirokazu Chiba: Innovator in Ruthenium and Titanium Complexes

Introduction

Hirokazu Chiba is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of ruthenium and titanium complexes. With a total of 6 patents to his name, Chiba's work has advanced the production of thin films used in various applications.

Latest Patents

Chiba's latest patents include a ruthenium complex and a method for producing the same, as well as a method for producing a ruthenium-containing thin film. The invention provides a ruthenium complex represented by specific formulas, which is useful for producing a thin film under both oxidizing and reducing gas conditions. Additionally, he has developed novel titanium complexes that exhibit high vapor pressure and thermal stability, serving as excellent materials for titanium-containing thin films. These innovations are crucial for techniques such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD).

Career Highlights

Throughout his career, Hirokazu Chiba has worked with notable companies, including Tosoh Corporation and Sagami Chemical Research Institute. His experience in these organizations has allowed him to refine his expertise in materials science and patent development.

Collaborations

Chiba has collaborated with esteemed colleagues, including Noriaki Oshima and Toshiki Yamamoto. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Hirokazu Chiba's innovative work in ruthenium and titanium complexes has made a significant impact in the field of materials science. His contributions continue to influence the production of advanced thin films, showcasing his role as a leading inventor in this domain.

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