The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Dec. 06, 2013
Tosoh Corporation, Shunan-shi, Yamaguchi, JP;
Sagami Chemical Research Institute, Ayase-shi, Kanagawa, JP;
Kenichi Tada, Kanagawa, JP;
Toshiki Yamamoto, Kanagawa, JP;
Hiroyuki Oike, Kanagawa, JP;
Atsushi Maniwa, Kanagawa, JP;
Hirokazu Chiba, Kanagawa, JP;
Kohei Iwanaga, Kanagawa, JP;
Kazuhisa Kawano, Kanagawa, JP;
TOSOH CORPORATION, Shunan, JP;
SAGAMI CHEMICAL RESEARCH INSTITUTE, Ayase, JP;
Abstract
The present invention is to provide a ruthenium complex represented by formula (1a), (2), (3), etc., which is useful for producing a ruthenium-containing thin film both under the conditions using an oxidizing gas as the reaction gas and under the conditions using a reducing gas as the reaction gas: wherein Rto R, R, Rand Rto Rrepresents an alkyl group having a carbon number of 1 to 6, etc., and n represents an integer of 0 to 2.