The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Apr. 07, 2004
Taishi Furukawa, Ebina, JP;
Noriaki Oshima, Yokohama, JP;
Kenichi Sekimoto, Sagamihara, JP;
Tosoh Corporation, Yamaguchi, JP;
Abstract
A novel bismuth compound having excellent vaporization characteristic and/or thermal stability, a process of producing the same and a process of producing a film in the film formation by the CVD process are disclosed. Bismuth compounds each represented by the following formula 1, 5 and 9, processes of producing the same, and processes of producing a film. In the formulae, Rand Reach represents a lower alkyl group; R, R, R, and Reach represents a lower alkyl group, a lower alkoxy group, or the like; m represents the number of the substituent Rin the range of 0-5; n, n, and nrespectively represent the number of the substituent R, the number of the substituent R, and the number of the substituent Reach in the range of 0-4; and Rto R, Rto R, R, and Reach represents hydrogen, a lower alkyl group, or the like, provided that specific combinations of the substituents are excluded.