Noriaki Fujitani is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of resist technology, holding a total of 15 patents. His work focuses on developing advanced materials and compositions for lithography applications.

Latest Patents

Fujitani's latest patents include a resist underlayer film-forming composition that features a compound with an amino group protected by a tert-butoxycarbonyl group. This innovative composition allows for the formation of resist patterns with reduced line width roughness (LWR), enhancing the precision of lithography processes. Another notable patent is a new coating liquid for resist pattern coating, which comprises a polymer with hydroxy or carboxy groups, a sulfonic acid component, and an organic solvent. This coating liquid is designed to improve the efficiency and effectiveness of resist pattern formation.

Career Highlights

Fujitani is currently employed at Nissan Chemical Industries Limited, where he continues to push the boundaries of resist technology. His expertise and innovative approach have positioned him as a key figure in the development of advanced materials for the semiconductor industry.

Collaborations

Fujitani has collaborated with notable colleagues such as Rikimaru Sakamoto and Takafumi Endo. These partnerships have fostered a creative environment that encourages the exchange of ideas and the advancement of technology.

Conclusion

Noriaki Fujitani's contributions to resist technology and his impressive portfolio of patents highlight his role as a leading inventor in the field. His work continues to influence the development of innovative materials that are essential for modern lithography applications.

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