The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2016
Filed:
Jul. 31, 2012
Rikimaru Sakamoto, Toyama, JP;
Noriaki Fujitani, Toyama, JP;
Takafumi Endo, Toyama, JP;
Ryuji Ohnishi, Toyama, JP;
Bangching Ho, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
Noriaki Fujitani, Toyama, JP;
Takafumi Endo, Toyama, JP;
Ryuji Ohnishi, Toyama, JP;
Bangching Ho, Toyama, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
There is provided a resist underlayer film composition for EUV lithography that is used in a device production process using EUV lithography, reduces adverse effects of EUV, and is effective for obtaining a good resist pattern, and to a method for forming a resist pattern that uses the resist underlayer film composition for EUV lithography. A resist underlayer film-forming composition for EUV lithography, including: a polymer having a repeating unit structure of formula (1): [where each of A, A, A, A, A, and Ais a hydrogen atom, a methyl group, or an ethyl group; Xis formula (2), formula (3), formula (4), or formula (0): Q is formula (5) or formula (6): and a solvent. A resist underlayer film-forming composition for EUV lithography, comprising: the polymer having the repeating unit structure of formula (1); a crosslinkable compound; and a solvent.