Toyama, Japan

Bangching Ho

This inventor holds 8 USPTO granted patents. Top assignee: Nissan Chemical Industries Limited. Active years: 2014-2023.


% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2014-2023

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8 patents (USPTO):Explore Patents

Title: Bangching Ho: Innovator in EUV Lithography

Introduction

Bangching Ho is a prominent inventor based in Toyama, Japan, known for his significant contributions to the field of lithography. With a total of eight patents to his name, he has made remarkable advancements in the development of materials used in semiconductor manufacturing.

Latest Patents

His latest patents include a composition for forming a resist overlayer film for EUV lithography. This innovative composition is designed to block unfavorable exposure light while selectively transmitting EUV light, ensuring high precision in the lithography process. Additionally, he has developed a composition for forming a resist underlayer film that reduces outgassing, which is crucial for maintaining the integrity of semiconductor devices during exposure to high-energy radiation.

Career Highlights

Bangching Ho is currently employed at Nissan Chemical Industries Limited, where he continues to push the boundaries of technology in the semiconductor industry. His work focuses on enhancing the performance and reliability of lithography materials, which are essential for the production of advanced semiconductor devices.

Collaborations

He collaborates with notable colleagues such as Rikimaru Sakamoto and Takafumi Endo, contributing to a dynamic research environment that fosters innovation and excellence in their field.

Conclusion

Bangching Ho's contributions to EUV lithography and semiconductor manufacturing highlight his role as a leading inventor in the industry. His innovative patents and collaborative efforts continue to shape the future of technology.

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