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For the Inventor, By the Inventor

Tokyo, Japan

Nissan Chemical Industries Limited


USPTO Granted Patents = 1,235



Trademarks = 35

Forward Citations = 5,958

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1,158 inventors (with patents filed for the assignee):

goldMedal Rikimaru Sakamoto (81 out of 101 patents)

silverMedal Takahiro Kishioka (47 out of 64 patents)

bronzeMedal Tsutomu Nawamaki (44 out of 45 patents)

4.  Yoshitane Watanabe (43 out of 45 patents)

5.  Makoto Nakajima (37 out of 58 patents)

6.  Masaaki Ozawa (37 out of 37 patents)

7.  Takafumi Endo (35 out of 52 patents)

8.  Yoshinari Koyama (34 out of 38 patents)

9.  Keitaro Suzuki (34 out of 42 patents)

10.  Keisuke Hashimoto (32 out of 50 patents)

11.  Takuji Yoshimoto (31 out of 33 patents)

12.  Tadashi Hatanaka (29 out of 29 patents)

13.  Taku Kato (27 out of 30 patents)

14.  Tetsuya Shinjo (26 out of 38 patents)

15.  Katsuaki Miyaji (26 out of 27 patents)


Core Competencies:
Resist Underlayer Film
Metal Oxide Particles
Amorphous Semiconductor Layer
Transdermal Absorption
EUV Lithography
Electroconductive Film
Liquid Crystal Display
Photocrosslinkable Composition
Water Absorbing Body
Silicon-Containing Composition
Saccharification Reaction Mixture
Optical Member

1,235 patents:

1. 12405533 - Resist underlayer film-forming composition containing substituted crosslinkable compound (2025-09-02),
2. 12286562 - Metal oxide particles containing titanium oxide coated with silicon dioxide-stannic oxide complex oxide (2025-04-29),
3. 12242196 - Resist underlayer film-forming composition containing indolocarbazole novolak resin (2025-03-04),
4. 12242194 - Resist underlayer film-forming composition comprising epoxy adduct having long-chain alkyl group (2025-03-04),
5. 12072629 - Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added (2024-08-27),
6. 11894429 - Amorphous metal oxide semiconductor layer and semiconductor device (2024-02-06),
7. 11815815 - Composition for forming silicon-containing resist underlayer film removable by wet process (2023-11-14),
8. 11771645 - Transdermally absorbable base material containing lipid peptide compound (2023-10-03),
9. 11720024 - Resist underlayer film-forming composition containing indolocarbazole novolak resin (2023-08-08),
10. 11675269 - Composition for forming resist overlayer film for EUV lithography (2023-06-13),
11. 11674053 - Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure (2023-06-13),
12. 11650505 - Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound (2023-05-16),
13. 11634589 - Coating composition and optical member (2023-04-25),
14. 11592747 - Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin (2023-02-28),
15. 11561472 - Radiation sensitive composition (2023-01-24),
Nissan Chemical Industries Limited is a global chemical company based in Japan. They provide a range of products and solutions in sectors such as pharmaceuticals, agrochemicals, electronics, and automotive. With a commitment to research and innovation, Nissan Chemical Industries aims to contribute to society by creating sustainable and environmentally friendly solutions.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Jan 6 2026

1,235 Patents

#87 in Tokyo

#182 in Japan

#791 in the World

...
Tokyo, Japan

Nissan Chemical Industries Limited

Forward Citations = 5,958

1,158 inventors:

goldMedal Rikimaru Sakamoto (81 out of 101 patents)

silverMedal Takahiro Kishioka (47 out of 64 patents)

bronzeMedal Tsutomu Nawamaki (44 out of 45 patents)

4.  Yoshitane Watanabe (43 out of 45 patents)

5.  Makoto Nakajima (37 out of 58 patents)

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