The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2023
Filed:
Dec. 12, 2013
Nissan Chemical Industries, Ltd., Tokyo, JP;
Yasunobu Someya, Toyama, JP;
Ryo Karasawa, Toyama, JP;
Keisuke Hashimoto, Toyama, JP;
Tetsuya Shinjo, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
There is provided resist underlayer film for lithography process with high dry etching resistance, wiggling resistance, and heat resistance. Resist underlayer film-forming composition for lithography including polymer having unit structure of Formula (1): wherein A is hydroxy group-substituted Carylene group derived from polyhydroxy aromatic compound; B is Carylene group or Cheterocyclic group containing nitrogen atom, oxygen atom, sulfur atom, or combination thereof; Xis H, NH, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, or quaternary ammonium ion, T is hydrogen atom, Calkyl group or Caryl group that may be substituted with halogen group, hydroxy group, nitro group, amino group, carboxylate ester group, nitrile group, or combination thereof as substituent, or Cheterocyclic group containing nitrogen atom, oxygen atom, sulfur atom, or combination thereof, B and T may form Cring together with carbon atom to which they are bonded.