Toyama, Japan

Takafumi Endo

This inventor holds 54 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Resist Underlayer Films. Top assignees: Nissan Chemical Industries Limited, Nissan Chemical Corporation. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takafumi Endo. Retrieved from https://idiyas.com/inventor/takafumi-endo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 54 

% Patents Active = 94.4

 

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 37(Granted Patents)

Forward Citations (Not Self Cited) = 30(Dec 10, 2025)


Location History:

  • Funabashi, JP (2019)
  • Toyama, JP (2013 - 2024)

Company Filing History:


Years Active: 2013-2026

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Areas of Expertise:
Resist Composition
Underlayer Film
EUV Lithography
Chemical Resistance
Photocurable Composition
Semiconductor Device
Novolac Resin
Polymeric Structure
Coating Composition
Crosslinkable Compound
Self-Organizing Film
Dicyanostyryl Group
54 patents (USPTO):Explore Patents

Title: Takafumi Endo: Innovative Patents Leading Semiconductor Advancements

Introduction:

Takafumi Endo, a highly skilled inventor and innovator based in Toyama, Japan, has made significant contributions to the field of semiconductors through his extensive patent portfolio. With an impressive number of patents to his name and a focus on protective film-forming compositions and photocurable compositions, Endo has emerged as a key figure in the advancement of semiconductor technologies.

Latest Patents:

Endo's recent patents highlight his expertise in protective film-forming compositions and cutting-edge methods for producing semiconductor devices. One notable invention is the "Protective Film Forming Composition Having a Diol Structure." This composition provides a protective film that effectively guards against semiconductor wet etching solutions while maintaining excellent resistance throughout the lithographic process. The film can be quickly removed by dry etching, offering a practical and efficient solution.

Another notable patent is the "Photocurable Composition and Method for Producing Semiconductor Device." This innovative formulation enables the formation of coating films with superior flattening properties and high fillability into patterns. The composition also reduces thermal shrinkage, producing coating films of exceptional quality. Endo's integration of photodegradable nitrogen-containing and/or sulfur-containing structures, along with hydrocarbon structures, demonstrates his ingenuity in creating advanced semiconductor materials.

Career Highlights:

Throughout his career, Endo has held positions in prestigious companies at the forefront of semiconductor research and development. Notably, he has contributed extensively to the advancements of Nissan Chemical Industries Limited and Nissan Chemical Corporation. Endo's expertise and dedication have made him an invaluable asset to these organizations, enabling them to stay at the forefront of semiconductor innovation.

Collaborations:

Endo has enjoyed fruitful collaborations with esteemed colleagues within the semiconductor industry. Rikimaru Sakamoto and Keisuke Hashimoto are two notable collaborators who have worked alongside him. These partnerships have fostered an environment of shared knowledge and expertise, leading to groundbreaking advancements in the field of semiconductors.

Conclusion:

Takafumi Endo's exceptional expertise and numerous patents in protective film-forming compositions and photocurable compositions have made him a pioneering force within the semiconductor industry. Through his inventions, he has significantly contributed to the development and progress of semiconductor technologies. As the field continues to evolve, Endo's innovative contributions will undoubtedly shape the future of semiconductors, enabling faster and more efficient devices for various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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