The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Jun. 17, 2020
Applicant:
Nissan Chemical Corporation, Tokyo, JP;
Inventors:
Takafumi Endo, Toyama, JP;
Yuki Endo, Toyama, JP;
Assignee:
NISSAN CHEMICAL CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); C07D 251/34 (2006.01); G03F 7/11 (2006.01); G03F 7/36 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C07D 251/34 (2013.01); G03F 7/11 (2013.01); G03F 7/36 (2013.01); H01L 21/0274 (2013.01);
Abstract
A resist underlayer film, which, while exhibiting excellent resistance to a resist developer which is a resist solvent or an alkaline aqueous solution, exhibits removability, and preferably solubility, only in wet etching chemicals. This composition for forming a resist underlayer film contains a solvent, a heterocyclic compound having a dicyanostyryl group, a cyclic compound including an amide group, for example, and the reaction product of a heterocyclic compound precursor having an epoxy group and an active proton compound, for example.