The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Mar. 07, 2017
Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Takafumi Endo, Toyama, JP;

Keisuke Hashimoto, Toyama, JP;

Hirokazu Nishimaki, Toyama, JP;

Mamoru Tamura, Toyama, JP;

Rikimaru Sakamoto, Toyama, JP;

Hikaru Tokunaga, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/00 (2006.01); G03F 7/023 (2006.01); G03F 7/025 (2006.01); G03F 7/027 (2006.01); G03F 7/038 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0236 (2013.01); G03F 7/0035 (2013.01); G03F 7/025 (2013.01); G03F 7/027 (2013.01); G03F 7/0275 (2013.01); G03F 7/038 (2013.01); G03F 7/0388 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); H01L 21/0271 (2013.01);
Abstract

A stepped substrate coating composition includes: a compound (E) containing partial structures (I) and (II) and a solvent (F). The partial structure (II) contains a hydroxy group generated by an epoxy group and a proton-generating compound reaction; the partial structure (I) is at least one partial structure selected from partial structures of Formula (1-1) to Formula (1-5) or a partial structure combining a partial structure of Formula (1-6) and Formula (1-7) or Formula (1-8); and the partial structure (II) is a partial structure of Formula (2-1) or Formula (2-2). The photocurable stepped substrate coating composition wherein in the compound (E), the epoxy group and the hydroxy group are contained in a molar ratio of 0≤(Epoxy group)/(Hydroxy group)≤0.5 and the partial structure (II) is contained in a molar ratio of 0.01≤(Partial structure (II))/(Partial structure (I)+Partial structure (II))≤0.8.


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