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Years Active: 2016-2024
Title: Innovations of Mamoru Tamura
Introduction
Mamoru Tamura is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of resist underlayer film-forming compositions. With a total of 14 patents to his name, Tamura's work has had a profound impact on the industry.
Latest Patents
Tamura's latest patents include a resist underlayer film-forming composition that features a reaction product of acid dianhydride. This composition is designed for forming a resist underlayer film that enables the creation of a desired resist pattern. Additionally, he has developed methods for producing a resist pattern and a semiconductor device using this composition. Another notable patent involves a resist underlayer film-forming composition that contains a resin with a specific unit structure. This composition provides a resist underlayer film with excellent solvent resistance, optical parameters, dry etching rate, and embeddability.
Career Highlights
Throughout his career, Mamoru Tamura has worked with prominent companies such as Nissan Chemical Industries Limited and Nissan Chemical Corporation. His expertise in the field has allowed him to contribute to various innovative projects and advancements in semiconductor technology.
Collaborations
Tamura has collaborated with several professionals in his field, including Tomoyuki Enomoto and Takahiro Kishioka. These collaborations have further enhanced his research and development efforts.
Conclusion
Mamoru Tamura's contributions to the field of semiconductor technology through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence advancements in the industry, showcasing the significance of his inventions.