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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10174168 B1

PDFFull Text
Date of Patent:
Jan. 08, 2019

Filed:

Jul. 05, 2016

Composition for forming passivation film, including resin having carbon-carbon multiple bond

Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Mamoru Tamura, Toyama, JP;

Hiroshi Ogino, Toyama, JP;

Tomoyuki Enomoto, Toyama, JP;

Assignee:

NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Shane Fang

Int. Cl.
CPC ...
C08G 8/02 (2006.01); C08G 65/40 (2006.01); C08G 65/48 (2006.01); C08G 75/20 (2016.01); H01L 21/02 (2006.01); H01L 21/56 (2006.01); H01L 23/29 (2006.01); H01L 23/31 (2006.01); H01L 23/48 (2006.01); H01L 29/06 (2006.01); C09D 161/16 (2006.01); C09D 171/12 (2006.01); C09D 181/06 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C08G 75/20 (2013.01); C08G 8/02 (2013.01); C08G 65/40 (2013.01); C08G 65/48 (2013.01); C09D 161/16 (2013.01); C09D 171/12 (2013.01); C09D 181/06 (2013.01); H01L 21/02118 (2013.01); H01L 21/02318 (2013.01); H01L 21/56 (2013.01); H01L 21/76898 (2013.01); H01L 23/293 (2013.01); H01L 23/3171 (2013.01); H01L 23/481 (2013.01); H01L 29/06 (2013.01); H01L 2924/0002 (2013.01);
Abstract

There is provided a composition for forming a passivation film that satisfies electric insulation, heat-tolerance, solvent-tolerance, and a dry etch back property at the same time. A composition for forming a passivation film, including: a polymer containing a unit structure of Formula (i):T-O  Formula (i)(where Tis a sulfonyl group, a fluoroalkylene group, a cycloalkylene group, or an arylene group having a substituent, or is a combination of an arylene group optionally having a substituent and a fluoroalkylene group or a cycloalkylene group), wherein the polymer has at least one of a group having a structure of Formula (2-A), a group having a structure of Formula (2-B), or a group having both of the structures, at an end, in a side chain, or in a main chain of the polymer: The polymer may contain a unit structure of Formula (1):L-O-T-O  Formula (1)

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