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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10048585 B1

PDFFull Text
Date of Patent:
Aug. 14, 2018

Filed:

Mar. 09, 2016

Resin composition, method for forming pattern using the same, and method for synthesizing polymer

Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Mamoru Tamura, Toyama, JP;

Tomoyuki Enomoto, Toyama, JP;

Assignee:

NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08G 65/40 (2006.01); C09D 171/00 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/40 (2006.01); G03F 7/023 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C08G 65/48 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01); C08G 65/40 (2013.01); C08G 65/48 (2013.01); C09D 171/00 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0758 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01);
Abstract

A resin composition for forming an insulating film including a polymer having a structural unit of the following formula (1a) and a structural unit of the following formula (1b); and an organic solvent; wherein Tis a divalent organic group containing at least one arylene group in which at least one hydrogen atom is substituted with an amino group; and Tis a divalent organic group containing at least one arylene group having at least one substituent, wherein the substituent is a substituent of the following formula (2); and wherein Z is a divalent, aliphatic, aromatic, or alicyclic group optionally having a substituent.

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