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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11561472 B1

PDFFull Text
Date of Patent:
Jan. 24, 2023

Filed:

Jun. 07, 2016

Radiation sensitive composition

Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Makoto Nakajima, Toyama, JP;

Kenji Takase, Funabashi, JP;

Satoshi Takeda, Toyama, JP;

Wataru Shibayama, Toyama, JP;

Assignee:

NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/038 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01); C07F 7/18 (2006.01); C08G 77/50 (2006.01); C08G 77/14 (2006.01); C08G 77/06 (2006.01); C08G 77/18 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C07F 7/18 (2013.01); C07F 7/1804 (2013.01); C08G 77/06 (2013.01); C08G 77/14 (2013.01); C08G 77/18 (2013.01); C08G 77/50 (2013.01); G03F 7/0045 (2013.01); G03F 7/038 (2013.01); G03F 7/075 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2002 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/36 (2013.01); G03F 7/38 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01);
Abstract

A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1)RRSi(R)  Formula (1)wherein Ris an organic group of Formula (1-2) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and Ris a hydrolyzable group; and Formula (2)RRSi(R)  Formula (2)wherein Ris an organic group of Formula (2-1) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and Ris a hydrolyzable group.

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