IDiyas

For the Inventor, By the Inventor

Toyama, Japan

Wataru Shibayama

USPTO Granted Patents = 31 

 

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 41(Granted Patents)


Company Filing History:

goldMedal22 out of 1,235 
 
Nissan Chemical Industries Limited
 patents
silverMedal9 out of 213 
 
Nissan Chemical Corporation
 patents
bronzeMedal1 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2013-2025

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31 patents (USPTO):Explore Patents
1. 12372875 - Composition for resist pattern metallization process (2025-07-29),
2. 12248251 - Silicon-containing resist underlayer film-forming composition including organic group having ammonium group (2025-03-11),
3. 12227621 - Film-forming composition (2025-02-18),
4. 12084592 - Coating composition for pattern inversion (2024-09-10),
5. 11966164 - Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group (2024-04-23),
6. 11815815 - Composition for forming silicon-containing resist underlayer film removable by wet process (2023-11-14),
7. 11561472 - Radiation sensitive composition (2023-01-24),
8. 11531269 - Method for producing resist pattern coating composition with use of solvent replacement method (2022-12-20),
9. 11392037 - Resist underlayer film forming composition containing silicone having cyclic amino group (2022-07-19),
10. 11281104 - Alkaline developer soluable silicon-containing resist underlayer film-forming composition (2022-03-22),
11. 11215927 - Substrate treating composition and method for fabricating a semiconductor device using the same (2022-01-04),
12. 11175583 - Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore (2021-11-16),
13. 11022884 - Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group (2021-06-01),
14. 10838303 - Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton (2020-11-17),
15. 10676491 - Isocyanuric acid derivative having alkoxyalkyl groups and method for producing the same (2020-06-09),

Title: Wataru Shibayama: Pioneering Inventor from Toyama, JP

Introduction: Wataru Shibayama is a renowned inventor hailing from the picturesque city of Toyama, Japan. With a passion for innovation and a keen eye for detail, he has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents: Wataru Shibayama holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions. His most recent patents focus on enhancing efficiency in industrial processes and improving the quality of life for individuals through technological advancements.

Career Highlights: Throughout his illustrious career, Wataru Shibayama has worked with leading tech companies and research institutions to bring his inventions to life. His innovative spirit and dedication to pushing the boundaries of technology have earned him recognition as a trailblazer in the industry.

Collaborations: Wataru Shibayama has collaborated with top engineers, scientists, and designers from around the world to develop cutting-edge solutions to complex challenges. His collaborative efforts have resulted in the creation of revolutionary products that have had a lasting impact on society.

Conclusion: In conclusion, Wataru Shibayama's relentless pursuit of innovation and his commitment to excellence have solidified his reputation as a visionary inventor. His contributions to the field of technology continue to inspire future generations of inventors to push the limits of what is possible.

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