The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Dec. 25, 2019
Applicant:
Nissan Chemical Corporation, Tokyo, JP;
Inventors:
Wataru Shibayama, Toyama, JP;
Yutaro Kuramoto, Toyama, JP;
Satoshi Takeda, Toyama, JP;
Shuhei Shigaki, Toyama, JP;
Ken Ishibashi, Toyama, JP;
Makoto Nakajima, Toyama, JP;
Assignee:
NISSAN CHEMICAL CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); C07F 7/10 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0752 (2013.01); C07F 7/10 (2013.01); G03F 7/11 (2013.01); G03F 7/2004 (2013.01);
Abstract
A film-forming composition is suitable as a resist underlayer film-forming composition capable of forming an Si-containing resist underlayer film that exhibits favorable adhesion to an EUV resist and favorable etching processability because of high rate of etching with fluorine. A film-forming composition, for example, including a polymer of Formula (E1) and a solvent.