This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nissan Chemical Corporation. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Yutaro Kuramoto: Innovator in Film Forming Composition
Introduction
Yutaro Kuramoto is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of film-forming compositions, particularly in the context of semiconductor manufacturing. His innovative work has led to the development of a unique resist underlayer film that enhances the performance of EUV resists.
Latest Patents
Yutaro Kuramoto holds 1 patent for his invention related to a film-forming composition. This composition is designed to create an Si-containing resist underlayer film that demonstrates excellent adhesion to EUV resists. Additionally, it offers favorable etching processability due to its high etching rate with fluorine. The composition includes a polymer of Formula (E1) and a solvent, showcasing Kuramoto's expertise in material science.
Career Highlights
Kuramoto is currently employed at Nissan Chemical Corporation, where he continues to push the boundaries of innovation in chemical compositions. His work is pivotal in advancing technologies that are essential for modern electronics and semiconductor applications.
Collaborations
Some of his notable coworkers include Wataru Shibayama and Shuhei Shigaki. Their collaborative efforts contribute to the ongoing research and development initiatives at Nissan Chemical Corporation.
Conclusion
Yutaro Kuramoto's contributions to the field of film-forming compositions exemplify the importance of innovation in technology. His work not only enhances the performance of semiconductor materials but also reflects the collaborative spirit of research and development in the industry.