The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2025
Filed:
Oct. 25, 2019
Applicant:
Nissan Chemical Corporation, Tokyo, JP;
Inventors:
Wataru Shibayama, Toyama, JP;
Yuichi Goto, Toyama, JP;
Shun Kubodera, Toyama, JP;
Satoshi Takeda, Toyama, JP;
Ken Ishibashi, Toyama, JP;
Makoto Nakajima, Toyama, JP;
Assignee:
NISSAN CHEMICAL CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); C08G 77/26 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
C08G 77/26 (2013.01); H01L 21/0274 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01);
Abstract
A film-forming composition suitable as a resist underlayer film-forming composition from which a resist underlayer film having not only a good EUV resist adhesivity but also a good etching processability due to a high fluorine-based etching rate. For example, a film-forming composition includes a polymer represented by Formula (E1) and a solvent.