Ken Ishibashi

Title: Ken Ishibashi: Innovator in Resist Pattern Metallization

Introduction

Ken Ishibashi is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of resist pattern metallization, holding a total of four patents. His work focuses on improving the quality and efficiency of resist patterns used in various applications.

Latest Patents

Ishibashi's latest patents include a composition for a resist pattern metallization process. This composition aims to ameliorate the collapse and roughness of a resist pattern while enhancing etching resistance. It involves metallizing a resist in the resist pattern and utilizes a specific combination of components, including metal oxides and hydrolyzable silane compounds. Another notable patent is a silicon-containing resist underlayer film-forming composition. This composition features an organic group with an ammonium group and is designed to form a resist underlayer film through hydrolysis and condensation of hydrolyzable silanes.

Career Highlights

Ken Ishibashi is currently employed at Nissan Chemical Corporation, where he continues to innovate in the field of chemical compositions for resist patterns. His expertise and contributions have positioned him as a key figure in his industry.

Collaborations

Ishibashi has collaborated with notable coworkers, including Wataru Shibayama and Makoto Nakajima. Their combined efforts have further advanced the research and development of resist pattern technologies.

Conclusion

Ken Ishibashi's work in resist pattern metallization showcases his innovative spirit and dedication to improving technological processes. His patents reflect a commitment to enhancing the quality and efficiency of resist patterns in various applications.