Shun Kubodera

Title: Shun Kubodera: Innovator in Film-Forming Compositions

Introduction

Shun Kubodera is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of chemical compositions, particularly in the development of film-forming materials. With a total of two patents to his name, Kubodera's work is recognized for its innovative approach and practical applications.

Latest Patents

Kubodera's latest patents include a film-forming composition that serves as a resist underlayer film-forming composition. This composition is designed to provide excellent EUV resist adhesivity and superior etching processability due to a high fluorine-based etching rate. The film-forming composition comprises a polymer represented by a specific formula and a solvent. Another significant patent involves an isocyanuric acid derivative that features two alkoxyalkyl groups and a trialkoxysilyl group. This novel derivative is characterized by its unique structure, which may be liquid at ambient temperature and pressure.

Career Highlights

Shun Kubodera is currently employed at Nissan Chemical Corporation, where he continues to advance his research and development efforts. His work at the company has positioned him as a key player in the field of chemical innovations.

Collaborations

Kubodera collaborates with esteemed colleagues such as Wataru Shibayama and Yuichi Goto. Their combined expertise contributes to the success of their projects and enhances the innovative capacity of their work.

Conclusion

Shun Kubodera's contributions to the field of film-forming compositions exemplify the impact of innovative thinking in chemical engineering. His patents reflect a commitment to advancing technology and improving industrial processes.