The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Nov. 26, 2020
Nissan Chemical Corporation, Tokyo, JP;
Yuto Hashimoto, Toyama, JP;
Shun Kubodera, Toyama, JP;
Shigetaka Otagiri, Toyama, JP;
Satoshi Kamibayashi, Toyama, JP;
Tokio Nishita, Toyama, JP;
Yuichi Goto, Toyama, JP;
Yasunobu Someya, Toyama, JP;
Yuki Endo, Toyama, JP;
NISSAN CHEMICAL CORPORATION, Tokyo, JP;
Abstract
Provided is a composition which is for forming a resist underlayer film and with which the amount of a sublimate derived from a low-molecular-weight component such as an oligomer can be reduced, the composition comprising, for example, an organic solvent and a polymer having a repeating unit represented by formula (1-1), wherein the content of a low-molecular-weight component having a weight average molecular weight of 1,000 or less is 10 mass % or less in the polymer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile