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Funabashi, Japan

Kenji Takase

USPTO Granted Patents = 16

EPO Patents = 2

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 6(Granted Patents)

Location History:

Toyama, JP (2015 - 2020)
Funabashi, JP (2019 - 2023)

Company Filing History:

15 out of 1,235

Nissan Chemical Industries Limited

Nissan Chemical Corporation

Years Active: 2015-2025

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12405533 - Resist underlayer film-forming composition containing substituted crosslinkable compound (2025-09-02),

2. 11561472 - Radiation sensitive composition (2023-01-24),

3. 11175583 - Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore (2021-11-16),

4. 11022884 - Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group (2021-06-01),

5. 10845703 - Film-forming composition containing silicone having crosslinking reactivity (2020-11-24),

6. 10809619 - Resist underlayer film-forming composition containing substituted crosslinkable compound (2020-10-20),

7. 10684546 - Composition for forming resist underlayer film (2020-06-16),

8. 10450418 - Polymerizable composition comprising reactive silsesquioxane compound and aromatic vinyl compound (2019-10-22),

9. 10372040 - Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group (2019-08-06),

10. 10197917 - Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophore (2019-02-05),

11. 10079146 - Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atom (2018-09-18),

12. 10067423 - Additive and resist underlayer film-forming composition containing the same (2018-09-04),

13. 9765097 - Method for producing silane compound having sulfonyl bond (2017-09-19),

14. 9494862 - Resist underlayer film forming composition containing silicon having sulfone structure and amine structure (2016-11-15),

15. 9290623 - Composition for forming silicon-containing resist underlayer film having cyclic diester group (2016-03-22),

Title: Kenji Takase: Pioneering Inventor from Funabashi

Introduction: Kenji Takase is a renowned inventor hailing from Funabashi, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kenji Takase holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Kenji Takase has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Kenji Takase has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge-sharing.

Conclusion: Kenji Takase's passion for innovation, coupled with his relentless drive to push the boundaries of technology, has solidified his reputation as a trailblazing inventor in Funabashi and beyond.

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