The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2019
Filed:
Dec. 04, 2015
Applicant:
Nissan Chemical Industries, Ltd., Tokyo, JP;
Inventors:
Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08L 83/04 (2006.01); G03F 7/40 (2006.01); C08L 83/06 (2006.01); C09D 183/04 (2006.01); G03F 7/26 (2006.01); C09D 165/00 (2006.01); C09D 183/08 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); H01L 21/027 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); G03F 7/075 (2006.01); C08G 16/00 (2006.01); C09D 161/00 (2006.01); C09D 183/06 (2006.01); C08G 77/26 (2006.01); C08G 73/06 (2006.01); C08G 77/24 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08G 16/00 (2013.01); C08L 83/04 (2013.01); C08L 83/06 (2013.01); C09D 161/00 (2013.01); C09D 165/00 (2013.01); C09D 183/04 (2013.01); C09D 183/06 (2013.01); C09D 183/08 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0752 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/26 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31133 (2013.01); H01L 21/31144 (2013.01); C08G 73/0672 (2013.01); C08G 77/24 (2013.01); C08G 77/26 (2013.01); C08G 2261/135 (2013.01); C08G 2261/3142 (2013.01); C08G 2261/3241 (2013.01); C08G 2261/76 (2013.01); G03F 7/162 (2013.01);
Abstract
A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.