The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Dec. 06, 2010
Yusuke Horiguchi, Toyama, JP;
Makiko Umezaki, Toyama, JP;
Noriaki Fujitani, Toyama, JP;
Hirokazu Nishimaki, Toyama, JP;
Takahiro Kishioka, Toyama, JP;
Takahiro Hamada, Toyama, JP;
Yusuke Horiguchi, Toyama, JP;
Makiko Umezaki, Toyama, JP;
Noriaki Fujitani, Toyama, JP;
Hirokazu Nishimaki, Toyama, JP;
Takahiro Kishioka, Toyama, JP;
Takahiro Hamada, Toyama, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
A composition for forming a resist underlayer film to be used in a lithography process, that includes: a polymer containing unit structures of Formula (1), Formula (2), and Formula (3): the polymer being a polymer in which the unit structure of Formula (1) has a ratio of mole number (a) within a range of 0.20≦a≦0.90, the unit structure of Formula (2) has a ratio of mole number (b) within a range of 0.05≦b≦0.60, and the unit structure of Formula (3) has a ratio of mole number (c) within a range of 0.001≦c≦0.40, when a total mole number of all unit structures constituting the polymer is 1.0, and the polymer having a weight average molecular weight of 3,000 to 100,000; a crosslinkable compound; a photoacid generator; and a solvent.