Makiko Umezaki

Title: The Innovative Contributions of Makiko Umezaki

Introduction

Makiko Umezaki is a prominent inventor based in Toyama, Japan. She has made significant contributions to the field of film forming compositions, particularly in the context of lithography processes. With a total of 8 patents to her name, Umezaki's work has had a substantial impact on the industry.

Latest Patents

Umezaki's latest patents focus on a film forming composition that contains a fluorine-containing surfactant. This innovative film is designed to reduce the formation of an edge reservoir at the periphery, which can lead to unnecessary residues that are difficult to remove through etching processes. The composition includes a surfactant that contains a polymer and an oligomer with a C-perfluoroalkyl partial structure. This structure may also incorporate an alkyl partial structure. The surfactant is present in amounts ranging from 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. Additionally, the composition includes a coating film resin, which can be a novolac resin, a condensation epoxy resin, a (meth)acrylic resin, a polyether-based resin, or a silicon-containing resin. The resulting film can serve as either a resist underlayer film or a resist overlayer film.

Career Highlights

Throughout her career, Umezaki has worked with notable organizations, including Nissan Chemical Industries Limited and Kyoto University. Her experience in these institutions has allowed her to refine her expertise in film forming technologies and contribute to advancements in the field.

Collaborations

Umezaki has collaborated with esteemed colleagues such as Takahiro Kishioka and Taito Nishino. These partnerships have further enhanced her research and development efforts, leading to innovative solutions in her area of expertise.

Conclusion

Makiko Umezaki's contributions to the field of film forming compositions demonstrate her innovative spirit and dedication to advancing technology. Her patents reflect her commitment to solving complex challenges in lithography processes, making her a significant figure in her industry.