The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
Oct. 16, 2015
Applicant:
Nissan Chemical Industries, Ltd., Tokyo, JP;
Inventors:
Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/08 (2006.01); H01L 21/033 (2006.01); C08G 59/22 (2006.01); C08F 20/34 (2006.01); C08F 20/58 (2006.01); C09D 133/14 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0332 (2013.01); C08F 20/34 (2013.01); C08F 20/58 (2013.01); C08G 59/22 (2013.01); C09D 133/14 (2013.01); G03F 7/004 (2013.01); G03F 7/094 (2013.01); G03F 7/2002 (2013.01); H01L 21/0271 (2013.01);
Abstract
There is provided a composition that a resist pattern having a reduced LWR representing variations in line width of the resist pattern, compared to conventional resist patterns, can be formed. A resist underlayer film-forming composition for lithography comprising a polymer, 0.1 to 30 parts by mass of a compound having an amino group protected with a tert-butoxycarbonyl group and an unprotected carboxyl group, or a hydrate of the compound, relative to 100 parts by mass of the polymer, and a solvent.