The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Feb. 26, 2013
Nissan Chemical Industries, Ltd., Tokyo, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
A composition for forming a resist underlayer film for lithography, including a polymer having a repeating structural unit of Formula (1): Ris a hydrogen atom or a methyl group and Qis a group of Formula (2) or Formula (3): (wherein R, R, R, and Rare independently a hydrogen atom or a linear or branched hydrocarbon group having a carbon atom number of 1 to 4, Ris a hydrogen atom or a methyl group, Ris a linear or branched hydrocarbon group having a carbon atom number of 1 to 6, a Calkoxy group, a Calkylthio group, a halogen atom, a cyano group, or a nitro group, wis an integer of 0 to 3, wis an integer of 0 to 2, and x is an integer of 0 to 3), and vand vare independently 0 or 1; and an organic solvent.