logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10133178 B1

PDFFull Text
Date of Patent:
Nov. 20, 2018

Filed:

Sep. 18, 2015

Coating liquid for resist pattern coating

Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Tokio Nishita, Toyama, JP;

Shuhei Shigaki, Toyama, JP;

Noriaki Fujitani, Toyama, JP;

Takafumi Endo, Toyama, JP;

Rikimaru Sakamoto, Toyama, JP;

Assignee:

NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/40 (2006.01); C08F 212/12 (2006.01); C09D 5/00 (2006.01); C09D 7/00 (2018.01); C09D 183/04 (2006.01); C09D 201/00 (2006.01); C09D 7/20 (2018.01); C08G 8/04 (2006.01); C08G 77/14 (2006.01); C09D 125/16 (2006.01); G03F 7/039 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); C08F 212/12 (2013.01); C08G 8/04 (2013.01); C08G 77/14 (2013.01); C09D 5/00 (2013.01); C09D 7/00 (2013.01); C09D 7/20 (2018.01); C09D 125/16 (2013.01); C09D 183/04 (2013.01); C09D 201/00 (2013.01); G03F 7/039 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); H01L 21/0206 (2013.01); H01L 21/0273 (2013.01); H01L 21/02118 (2013.01); H01L 21/0332 (2013.01); H01L 21/31133 (2013.01);
Abstract

There is provided a new coating liquid for resist pattern coating. A coating liquid for resist pattern coating comprising a component A that is a polymer including at least one hydroxy group or carboxy group; a component B that is a sulfonic acid of A-SOH (where A is a linear or branched alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16, an aromatic group having at least one of the alkyl group or the fluorinated alkyl group as a substituent, or a Calicyclic group optionally having a substituent); and a component C that is an organic solvent capable of dissolving the polymer and including ether or ketone compound of R—O—Rand/or R—C(═O)—R(where Ris a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 3 to 16; and Ris a linear, branched, or cyclic alkyl group or fluorinated alkyl group having a carbon atom number of 1 to 16), a method of forming a resist pattern using the coating liquid, and a method for forming a reverse pattern using the coating liquid.

Find Patent Forward Citations

Loading…