The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Apr. 14, 2015
Nissan Chemical Industries, Ltd., Tokyo, JP;
Yasushi Sakaida, Toyama, JP;
Tokio Nishita, Toyama, JP;
Noriaki Fujitani, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. (wherein Ris a Calkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, Ris a hydrogen atom, a Calkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a Calkyl group optionally having a substituent, Ris a hydrogen atom, a Calkyl group, hydroxy group, or halogeno group, Ris a direct bond or divalent Corganic group, Ris a divalent Corganic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)