Nirasaki, Japan

Nobutaka Mizutani

This inventor holds 20 USPTO granted patents and 7 published patent applications, primarily in Plating Technology. Top assignees: Tokyo Electron Limited, Kansai University. Active years: 2007-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobutaka Mizutani. Retrieved from https://idiyas.com/inventor/nobutaka-mizutani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 95.0

Average Co-Inventor Count = 3.9

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Nirasaki, JP (2007 - 2019)
  • Yamanashi, JP (2019)
  • Tokyo, JP (2019 - 2022)

Company Filing History:


Years Active: 2007-2022

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Areas of Expertise:
Plating Method
Hard Mask Formation
Metal Wiring Layer
Catalyst Layer
Recording Medium
Plating Apparatus
Wiring Structure
Copper Displacement
Storage Medium
Liquid Processing
20 patents (USPTO):Explore Patents

Title: Innovations by Nobutaka Mizutani: A Deep Dive into His Patents and Contributions

Introduction: Nobutaka Mizutani, an accomplished inventor based in Nirasaki, Japan, has made significant contributions to the field of plating technology. With a portfolio of 20 patents, his work stands out for its innovative approaches to improving uniformity and efficiency in plating processes.

Latest Patents: Two of Mizutani's notable recent patents include a plating method and a novel apparatus designed to enhance the temperature uniformity of wafers during plating. His invention of a plating apparatus intricately involves a substrate holding unit to secure the wafer, a plating liquid supply unit for the distribution of plating liquid, and a solvent supply unit that introduces a temperature-different solvent to the substrate. This innovative approach ensures the consistent temperature across the wafer surface, optimizing the plating process.

Additionally, his formation method of a hard mask focuses on selectively imparting a catalyst to plateable material on a substrate with a non-plateable material portion. This inventive work allows for improved precision in creating hard mask layers, particularly emphasizing materials like SiO, OCH, and NH groups.

Career Highlights: Mizutani has been associated with prestigious organizations, including Tokyo Electron Limited, where he honed his expertise in plating technologies. His experience at such a renowned company has played a pivotal role in shaping his innovative approaches and patent contributions.

Collaborations: Throughout his career, Mizutani has worked alongside notable colleagues such as Takashi Tanaka and Mitsuaki Iwashita. Their collaboration has undoubtedly contributed to the development of groundbreaking technologies and innovative solutions within their fields.

Conclusion: Nobutaka Mizutani's innovative spirit and commitment to advancing plating technology are evident through his substantial patent portfolio and contributions to the industry. His recent patents reveal a clear intention towards enhancing efficiencies and uniformity in plating processes, paving the way for future advancements in the field. His work continues to inspire fellow inventors and underscores the importance of collaboration in fostering innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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