The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Jun. 20, 2012
Nobutaka Mizutani, Nirasaki, JP;
Takashi Tanaka, Nirasaki, JP;
Mitsuaki Iwashita, Nirasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A liquid displacement is performed by supplying a plating liquid onto a substratewhile rotating the substrateat a first rotational speed in a state that a pre-treatment liquid remains on a surface of the substrate(liquid displacement process (block S)). Then, an initial film is formed on the substrateby stopping the rotation of the substrateor by rotating the substrateat a second rotational speed while continuously supplying the plating liquid onto the substrate(incubation process (block S)). Thereafter, a plating film is grown by rotating the substrateat a third rotational speed while continuously supplying the plating liquid onto the substrate(plating film growing process (block S)). Here, the first rotational speed is higher than the third rotational speed, and the third rotational speed is higher than the second rotational speed.