The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2019

Filed:

Jun. 16, 2016
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Yuichiro Inatomi, Nirasaki, JP;

Takashi Tanaka, Nirasaki, JP;

Nobutaka Mizutani, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/50 (2006.01); C23C 18/38 (2006.01); C23C 18/16 (2006.01); C23C 18/32 (2006.01); H01L 21/768 (2006.01); H01L 21/288 (2006.01); C23C 18/18 (2006.01);
U.S. Cl.
CPC ...
C23C 18/50 (2013.01); C23C 18/1651 (2013.01); C23C 18/32 (2013.01); C23C 18/38 (2013.01); H01L 21/288 (2013.01); H01L 21/76873 (2013.01); H01L 21/76898 (2013.01); C23C 18/1653 (2013.01); C23C 18/1893 (2013.01); H01L 21/76843 (2013.01); H01L 2221/1089 (2013.01);
Abstract

Reliability of a plating process and reliability of a component manufactured through the plating process can be improved by suppressing peeling between plating layers formed by electroless plating. In a plating method, a plated component manufactured by the plating method, and a plating systemconfigured to manufacture the plated component by the plating method, a second electroless plating layer, which is made of a copper alloy and formed by the electroless plating, is formed on a surface of a first electroless plating layerformed by the electroless plating. The first electroless plating layeris a barrier layer configured to suppress diffusion of copper and is made of cobalt or a cobalt alloy. The second electroless plating layeris a seed layer for forming an electrolytic plating layer of copper on a surface thereof and is made of an alloy of copper and nickel.


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