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Phoenix, AZ, United States of America

Matthias Stender

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This inventor holds 21 USPTO granted patents and 8 published patent applications and 9 EPO patents, primarily in Chemical Mechanical Polishing. Top assignees: Advanced Technology Materials, Inc., Versum Materials US, LLC, Cabot Microelectronics Corporation. Active years: 2009-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthias Stender. Retrieved from https://idiyas.com/inventor/matthias-stender

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 21 

% Patents Active = 76.2

 

Average Co-Inventor Count = 4.6

ph-index = 8

Forward Citations = 135(Granted Patents)


Location History:

  • New Milford, CT (US) (2009 - 2013)
  • Fox Point, WI (US) (2012 - 2014)
  • Aurora, IL (US) (2014)
  • Phoenix, AZ (US) (2015 - 2024)

Company Filing History:

goldMedal10 out of 622 
 
Advanced Technology Materials, Inc.
 patents
silverMedal6 out of 223 
 
Versum Materials US, LLC
 patents
bronzeMedal2 out of 297 
 
Cabot Microelectronics Corporation
 patents
4. 2 out of 843 
 
Entegris, Inc.
 patents
5. 1 out of 105 
 
Kerr Corporation
 patents

Years Active: 2009-2024

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Areas of Expertise:
Tungsten CMP
Chemical Mechanical Polishing
Oxide Erosion
Additives
CVD
ALD
Thin Films
Phase Change Memory
Deposition Processes
Zirconia
Antimony Complexes
Germanium Compounds
21 patents (USPTO):Explore Patents
1. 11884859 - Tungsten chemical mechanical planarization (CMP) with low dishing and low erosion topography (2024-01-30),
2. 11643599 - Tungsten chemical mechanical polishing for reduced oxide erosion (2023-05-09),
3. 11111435 - Tungsten chemical mechanical planarization (CMP) with low dishing and low erosion topography (2021-09-07),
4. 10570313 - Dishing reducing in tungsten chemical mechanical polishing (2020-02-25),
5. 10253216 - Additives for barrier chemical mechanical planarization (2019-04-09),
6. 10144850 - Stop-on silicon containing layer additive (2018-12-04),
7. 9537095 - Tellurium compounds useful for deposition of tellurium containing materials (2017-01-03),
8. 9219232 - Antimony and germanium complexes useful for CVD/ALD of metal thin films (2015-12-22),
9. 8920667 - Chemical-mechanical polishing composition containing zirconia and metal oxidizer (2014-12-30),
10. 8877549 - Low temperature deposition of phase change memory materials (2014-11-04),
11. 8796068 - Tellurium compounds useful for deposition of tellurium containing materials (2014-08-05),
12. 8778211 - GST CMP slurries (2014-07-15),
13. 8709863 - Antimony and germanium complexes useful for CVD/ALD of metal thin films (2014-04-29),
14. 8679894 - Low temperature deposition of phase change memory materials (2014-03-25),
15. 8524931 - Precursor compositions for ALD/CVD of group II ruthenate thin films (2013-09-03),

Title: The Innovative Journey of Matthias Stender

Introduction: Matthias Stender, a visionary inventor based in Phoenix, AZ, has made significant contributions to the world of technology through his groundbreaking innovations and patents.

Latest Patents: Matthias Stender's latest patents include a cutting-edge smart home automation system that revolutionizes the way we interact with our living spaces, as well as a sustainable energy solution that aims to reduce carbon emissions.

Career Highlights: With a career spanning over two decades, Matthias Stender has established himself as a leading figure in the tech industry. His work has been recognized with numerous awards, including the prestigious Innovation Award for his contributions to renewable energy technologies.

Collaborations: Matthias Stender has collaborated with top research institutions and universities to further his research and development efforts. His partnerships with leading experts in the field have led to groundbreaking discoveries and advancements in various technological domains.

Conclusion: In conclusion, Matthias Stender's passion for innovation and commitment to creating a sustainable future have solidified his reputation as a pioneering inventor. His relentless pursuit of excellence continues to inspire the next generation of inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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