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Tempe, AZ, United States of America

Versum Materials Us, LLC

USPTO Granted Patents = 200

EPO Patents = 158

Trademarks = 43

Forward Citations = 544

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185 inventors (with patents filed for the assignee):

Xinjian Lei (83 out of 137 patents)

Manchao Xiao (53 out of 102 patents)

Mark Leonard O'Neill (37 out of 88 patents)

4. Xiaobo Shi (28 out of 45 patents)

5. Matthew R MacDonald (27 out of 28 patents)

6. Wen Dar Liu (25 out of 32 patents)

7. Yi-Chia Lee (25 out of 29 patents)

8. Raymond Nicholas Vrtis (25 out of 61 patents)

9. Hongjun Zhou (23 out of 26 patents)

10. Robert Gordon Ridgeway (23 out of 31 patents)

11. Jianheng Li (20 out of 27 patents)

12. Haripin Chandra (20 out of 28 patents)

13. Meiliang Wang (20 out of 21 patents)

14. Krishna P Murella (18 out of 22 patents)

15. Moo-Sung Kim (17 out of 29 patents)

Core Competencies:

Atomic Layer Deposition

Silicon Oxide Thin Films

Silicon Compounds

Chemical Mechanical Planarization

Silicon Nitride Removal

Ethylenediamine Applications

Silacycloalkanes

Lanthanide Complexes

Conformal Metal Films

Carbon Doped Silicon Films

High Purity Precursors

Etching Solutions

200 patents: Sort by Forward Citations

1. 12505999 - Precursors and flowable CVD methods for making low-K films to fill surface features (2025-12-23),

2. 12503760 - Methods of using high-purity alkynes for selective deposition (2025-12-23),

3. 12480206 - Organoaminodisilazanes for high temperature atomic layer deposition of silicon oxide thin films (2025-11-25),

4. 12454753 - Compositions and methods using same for deposition of silicon-containing film (2025-10-28),

5. 12441747 - Silicon compounds and methods for depositing films using same (2025-10-14),

6. 12435416 - Compositions and methods using same for non-conformal deposition of silicon containing films (2025-10-07),

7. 12428722 - Compositions and methods using same for deposition of silicon-containing film (2025-09-30),

8. 12428439 - Lanthanide and lanthanide-like transition metal complexes (2025-09-30),

9. 12421603 - Composition for high temperature atomic layer deposition of high quality silicon oxide thin films (2025-09-23),

10. 12410202 - Group V and VI transition metal precursors for thin film deposition (2025-09-09),

11. 12385137 - Method for depositing vanadium-containing films (2025-08-12),

12. 12325844 - Photoresist remover (2025-06-10),

13. 12320001 - Compositions and methods using same for thermal deposition silicon-containing films (2025-06-03),

14. 12319637 - High purity ethylenediamine for semiconductor applications (2025-06-03),

15. 12312684 - Siloxane compositions and methods for using the compositions to deposit silicon containing films (2025-05-27),

Versum Materials US, LLC is a leading supplier of materials, equipment, and services to the semiconductor and display industries. With a focus on innovation and customer satisfaction, Versum Materials strives to provide cutting-edge solutions and support for the manufacturing processes of advanced electronic devices. Visit our website to learn more about our products and services.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

200 Patents

#4 in Tempe, AZ

#24 in Arizona

#1,986 in US

#4,094 in the World

Tempe, AZ, United States of America

Versum Materials Us, LLC

Forward Citations = 544

185 inventors:

Xinjian Lei (83 out of 137 patents)

Manchao Xiao (53 out of 102 patents)

Mark Leonard O'Neill (37 out of 88 patents)

4. Xiaobo Shi (28 out of 45 patents)

5. Matthew R MacDonald (27 out of 28 patents)

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