San Marcos, CA, United States of America

Ronald Martin Pearlstein

This inventor holds 49 USPTO granted patents and 10 published patent applications, plus 3 CIPO patents and 17 EPO patents, primarily in Atomic Layer Deposition. Top assignees: Air Products and Chemicals, Inc., Versum Materials US, LLC. Active years: 1992-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ronald Martin Pearlstein. Retrieved from https://idiyas.com/inventor/ronald-martin-pearlstein

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 49 

% Patents Active = 91.8

 

 

Average Co-Inventor Count = 4.2

ph-index = 9

Forward Citations = 1,513(Granted Patents)


Location History:

  • Macungie, PA (US) (1992 - 2012)
  • San Marcos, CA (US) (2013 - 2022)
  • Tempe, AZ (US) (2021 - 2023)

Company Filing History:


Years Active: 1992-2026

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Areas of Expertise:
Atomic Layer Deposition
Semiconductor Applications
Gas Delivery Systems
Silicon Oxide Thin Films
Carbon-Doped Films
Ethylenediamine
Alkoxysilylamine Compounds
Chemical Mechanical Planarization
Hazardous Gas Storage
Ionic Liquid Mixtures
Lewis Acidic Compounds
Reactive Gas Purification
49 patents (USPTO):Explore Patents

Title: Innovations by Ronald Martin Pearlstein: A Leading Inventor in Silicon Technologies

Introduction: Ronald Martin Pearlstein, based in San Marcos, CA, has made significant contributions to the field of materials science, particularly in the domain of silicon technologies. With an impressive portfolio of 43 patents, his work focuses on innovative compositions and methods for enhancing silicon-related materials and processes.

Latest Patents: Among his latest patents are groundbreaking inventions such as "Compositions and processes for depositing carbon-doped silicon-containing films." This patent describes compositions for depositing carbon-doped silicon films, involving unique precursors like organoaminosilanes. It outlines various deposition methods, including cyclic chemical vapor deposition (CCVD), atomic layer deposition (ALD), plasma enhanced ALD (PEALD), and plasma enhanced CCVD (PECCVD). Another notable patent is "Selective deposition on silicon containing surfaces," which presents a novel method for selectively passivating surfaces on substrates. The method utilizes organoisocyanates to react specifically with silicon nitride surfaces, ensuring other areas remain unreacted.

Career Highlights: Ronald Pearlstein has had a successful career, notably with positions at recognized companies such as Air Products and Chemicals, Inc. and Versum Materials US, LLC. His experiences in these organizations have enabled him to pursue his innovative research effectively and contribute valuable patents to the industry.

Collaborations: Throughout his career, Pearlstein has worked alongside talented professionals, including notable collaborators like Manchao Xiao and Xinjian Lei. Their combined expertise has facilitated advancements in silicon-related technologies and innovations.

Conclusion: Ronald Martin Pearlstein stands out as a prominent inventor whose innovations in silicon technologies have significant implications for various applications. With his extensive patent portfolio, he continues to influence the field and drive future advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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