The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Mar. 15, 2019
Versum Materials Us, Llc, Tempe, AZ (US);
Manchao Xiao, Tempe, AZ (US);
Ronald Martin Pearlstein, Tempe, AZ (US);
Richard Ho, Tempe, AZ (US);
Daniel P. Spence, Tempe, AZ (US);
Xinjian Lei, Tempe, AZ (US);
Versum Materials US, LLC, Tempe, AZ (US);
Abstract
Described herein is an FCVD process for depositing a silicon-containing film from at least one alkoxysilylamine precursor having the following Formulae A and B: wherein Rand Rare independently selected from a linear or branched Cto Calkyl group, a Cto Calkenyl group, a Cto Calkynyl group, a Cto Ccyclic alkyl group, and a Cto Caryl group and wherein R, R, R, R, and Rare independently selected from the group consisting of hydrogen, a linear or branched Cto Calkyl group, a Cto Calkenyl group, a Cto Calkynyl group, a Cto Ccyclic alkyl, a Cto Caryl group, and a linear or branched Cto Calkoxy group.