Daniel P Spence

Title: Daniel P. Spence: Innovator in Silicon-Containing Films

Introduction: Daniel P. Spence is a prolific inventor based in Carlsbad, California, holding an impressive portfolio of 32 patents. His innovative work primarily focuses on advanced methods for the deposition of silicon-containing films, contributing significantly to the semiconductor industry.

Latest Patents: Among Daniel's latest inventions are two noteworthy patents. The first patent titled "Precursors and Flowable CVD Methods for Making Low-k Films to Fill Surface Features" describes a method for depositing a silicon-containing film. This method involves placing a substrate with surface features into a flowable CVD reactor, where at least one silicon-containing compound and one multifunctional organoamine compound are introduced. These components react to create a flowable liquid oligomer, which forms a silicon oxide coating that partially fills the surface features. Upon curing, the resulting silicon carbonitride coating exhibits excellent mechanical properties.

The second patent, "Organoamino-Polysiloxanes for Deposition of Silicon-Containing Films," pertains to organoamino-polysiloxanes containing at least three silicon atoms, oxygen atoms, and an organoamino group. This patent also details the methods for synthesizing these compounds and their application in depositing silicon and oxygen-containing films, highlighting the potential of these materials in various technological applications.

Career Highlights: Daniel P. Spence has had a notable career, contributing his expertise to prominent companies such as Air Products and Chemicals, Inc. and Versum Materials US, LLC. His work at these organizations has positioned him as a key player in the development of cutting-edge materials that are essential in the fabrication of advanced electronic components.

Collaborations: Throughout his career, Daniel has collaborated with esteemed colleagues, including Xinjian Lei and Manchao Xiao. These partnerships have further enriched his research and development efforts, enabling innovative solutions in the field of materials science.

Conclusion: With his extensive patent portfolio and impactful contributions to the field of silicon-containing films, Daniel P. Spence exemplifies the spirit of innovation. His work not only advances technology but also paves the way for future developments in semiconductor manufacturing and related industries. As he continues his research endeavors, the potential for further breakthroughs in his field remains promising.