logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11735413 B1

PDFFull Text
Date of Patent:
Aug. 22, 2023

Filed:

Oct. 20, 2017

Precursors and flowable cvd methods for making low-k films to fill surface features

Applicant:

Versum Materials Us, Llc, Tempe, AZ (US);

Inventors:

Manchao Xiao, San Diego, CA (US);

Daniel P. Spence, Carlsbad, CA (US);

Richard Ho, Anaheim, CA (US);

Assignee:

Versum Materials US, LLC, Tempe, AZ (US);

Attorney:

Daniel A. DeMarah, Jr.

Primary Examiner:

Gordon Baldwin

Assistant Examiner:

Mohammad Mayy

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/02 (2006.01); C23C 16/56 (2006.01); C23C 16/36 (2006.01); C23C 16/04 (2006.01); C09D 183/16 (2006.01); C23C 16/24 (2006.01); C23C 16/32 (2006.01); C23C 16/34 (2006.01); C23C 16/48 (2006.01); C23C 16/50 (2006.01); C08G 77/62 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02211 (2013.01); C09D 183/16 (2013.01); C23C 16/045 (2013.01); C23C 16/24 (2013.01); C23C 16/325 (2013.01); C23C 16/345 (2013.01); C23C 16/36 (2013.01); C23C 16/48 (2013.01); C23C 16/50 (2013.01); C23C 16/56 (2013.01); H01L 21/0217 (2013.01); H01L 21/0234 (2013.01); H01L 21/02167 (2013.01); H01L 21/02219 (2013.01); H01L 21/02271 (2013.01); H01L 21/02274 (2013.01); H01L 21/02348 (2013.01); H01L 21/02351 (2013.01); C08G 77/62 (2013.01); H01L 21/76224 (2013.01);
Abstract

A method for depositing a silicon-containing film, the method comprising: placing a substrate comprising at least one surface feature into a flowable CVD reactor; introducing into the reactor at least one silicon-containing compound and at least one multifunctional organoamine compound to at least partially react the at least one silicon-containing compound to form a flowable liquid oligomer wherein the flowable liquid oligomer forms a silicon oxide coating on the substrate and at least partially fills at least a portion of the at least one surface feature. Once cured, the silicon carbonitride coating has excellent mechanical properties.

Find Patent Forward Citations

Loading…