The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Sep. 11, 2020
Versum Materials Us, Llc, Tempe, AZ (US);
Manchao Xiao, San Diego, CA (US);
William Robert Entley, Gilbert, AZ (US);
Daniel P. Spence, Carlsbad, CA (US);
Raymond Nicholas Vrtis, Carlsbad, CA (US);
Jennifer Lynn Anne Achtyl, Chandler, AZ (US);
Robert Gordon Ridgeway, Chandler, AZ (US);
Xinjian Lei, Vista, CA (US);
Versum Materials US, LLC, Tempe, AZ (US);
Abstract
A method for making a dense organosilicon film with improved mechanical properties, the method comprising the steps of: providing a substrate within a reaction chamber; introducing into the reaction chamber a gaseous composition comprising a novel mono- or dialkoxysilane; and applying energy to the gaseous composition comprising the novel mono- or dialkoxysilane in the reaction chamber to induce reaction of the gaseous composition comprising the novel mono- or dialkoxysilane to deposit an organosilicon film on the substrate, wherein the organosilicon film has a dielectric constant of from about 2.8 to about 3.3, an elastic modulus of from about 7 to about 30 GPa, and an at. % carbon of from about 10 to about 30 as measured by XPS.