William Robert Entley

Title: Innovations of William Robert Entley in Silicon-Containing Films

Introduction

William Robert Entley, an accomplished inventor based in Center Valley, Pennsylvania, holds an impressive portfolio of eight patents. His work primarily focuses on the development of compositions and methods for the deposition of silicon-containing films, contributing significantly to advancements in materials science.

Latest Patents

Entley’s latest innovations include two notable patents. The first is related to compositions and methods for depositing silicon-containing films such as silicon oxide, silicon nitride, silicon oxynitride, carbon-doped silicon nitride, or carbon-doped silicon oxide films. This composition utilizes various compounds including siloxanes, trisilylamine-based compounds, and cyclic trisilazane compounds.

His second recent patent details a method and composition for producing a porous low-k dielectric film via chemical vapor deposition. The method involves introducing gaseous reagents, including an alkoxysilacyclic or acyloxysilacyclic compound, into a reaction chamber to deposit a preliminary film on a substrate. This film is then treated to remove a porogen, resulting in a film with a dielectric constant of 3.2 or less.

Career Highlights

Entley is currently employed at Versum Materials US, LLC, where he continues to explore the frontiers of material innovation. Over his career, he has made significant contributions to the field of chemical vapor deposition and dielectric materials, garnering recognition for his inventive solutions.

Collaborations

Throughout his career, Entley has collaborated with notable colleagues such as Raymond Nicholas Vrtis and Robert Gordon Ridgeway. These partnerships have likely fostered a creative environment leading to the development of impactful technologies in the materials science domain.

Conclusion

William Robert Entley exemplifies dedication and innovation in the field of materials science. His patents reflect a deep understanding of silicon-containing films and their applications, making significant strides in enhancing the performance and efficiency of dielectric materials. With ongoing contributions at Versum Materials, Entley’s work will continue to influence the industry for years to come.