The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Oct. 23, 2015
Applicant:

Versum Materials Us, Llc, Tempe, AZ (US);

Inventors:

Jianheng Li, Emmaus, PA (US);

John Francis Lehmann, Bethlehem, PA (US);

Xinjian Lei, Vista, CA (US);

Raymond Nicholas Vrtis, Orefield, PA (US);

Robert Gordon Ridgeway, Quakertown, PA (US);

William Robert Entley, Center Valley, PA (US);

Assignee:

VERSUM MATERIALS US, LLC, Tempe, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/34 (2006.01); H01L 21/02 (2006.01); C23C 16/36 (2006.01); C23C 16/48 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/401 (2013.01); C23C 16/345 (2013.01); C23C 16/36 (2013.01); C23C 16/48 (2013.01); C23C 16/50 (2013.01); H01L 21/0228 (2013.01); H01L 21/0234 (2013.01); H01L 21/02126 (2013.01); H01L 21/02164 (2013.01); H01L 21/02211 (2013.01); H01L 21/02216 (2013.01); H01L 21/02219 (2013.01); H01L 21/02222 (2013.01); H01L 21/02271 (2013.01); H01L 21/02274 (2013.01); H01L 21/02326 (2013.01); H01L 21/02337 (2013.01); H01L 21/02348 (2013.01);
Abstract

Compositions and methods using same for forming a silicon-containing film such as without limitation a silicon oxide, silicon nitride, silicon oxynitride, a carbon-doped silicon nitride, or a carbon-doped silicon oxide film on at least a surface of a substrate having a surface feature. In one aspect, the composition comprises at least one compound is selected from the group consisting of a siloxane, an trisilylamine-based compound, an organoaminodisilane compound, and a cyclic trisilazane compound.


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