The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2026

Filed:

Oct. 17, 2022
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Ravindra Kanjolia, North Andover, MA (US);

Jean-Sébastien Lehn, Winchester, MA (US);

Martin E. Mcbriarty, San Jose, CA (US);

Ronald Pearlstein, Carlsbad, CA (US);

Jared Leith Mcwilliams, Royal Oaks, CA (US);

Nguyen Minh Vu, San Jose, CA (US);

Assignee:

Versum Materials US, LLC, Tempe, AZ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/44 (2006.01); C23F 1/12 (2006.01);
U.S. Cl.
CPC ...
C23F 1/44 (2013.01); C23F 1/12 (2013.01);
Abstract

The disclosed and claimed subject matter relates to selective thermal atomic layer etching with a novel series of halogen-free organic acids cycled with an oxidant as a co-reactant to etch metals.


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