Ravindra Kanjolia

Title: Ravindra Kanjolia: Innovator in Metal-Containing Films

Introduction

Ravindra Kanjolia is a notable inventor based in North Andover, MA (US). He has made significant contributions to the field of materials science, particularly in the development of methods for forming metal-containing films. With a total of 3 patents to his name, Kanjolia's work has implications for various technological applications.

Latest Patents

Kanjolia's latest patents include innovative methods and compounds for selectively forming metal-containing films. One of his patents focuses on compounds for selectively forming these films, detailing methods that involve creating a blocking layer on a substrate surface through a specific deposition process. Another patent describes a method for forming low resistivity titanium nitride thin films in horizontal vias. This method includes the introduction of a precursor and a co-reactant into a reaction chamber, following defined exposure schedules to achieve a conformal layer of TiN.

Career Highlights

Throughout his career, Kanjolia has worked with prominent organizations, including Merck Patent GmbH and the University of California. His experience in these institutions has allowed him to refine his expertise in materials science and patent development.

Collaborations

Kanjolia has collaborated with notable colleagues such as Jacob Woodruff and Daniel Moser. These partnerships have contributed to the advancement of his research and innovations in the field.

Conclusion

Ravindra Kanjolia's contributions to the development of metal-containing films and his innovative methods have established him as a significant figure in materials science. His work continues to influence advancements in technology and industry.